PRETREATMENT APPARATUS FOR EXHAUST GAS FROM SEMICONDUCTOR MANUFACTURING PROCESS

PROBLEM TO BE SOLVED: To provide a pretreatment apparatus for an exhaust gas capable of assuring high pretreating efficiency. SOLUTION: An exhaust gas inlet 5 for introducing an exhaust gas, such as nitrogen trifluoride or the like, to be exhausted from a semiconductor manufacturing apparatus and an...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	SAEDA MANABU, KOMORI YUJI, MORISAWA MAKOTO
Format:	Patent
Sprache:	eng
Schlagworte:	BLASTING COMBUSTION APPARATUS COMBUSTION PROCESSES CONSUMING WASTE PRODUCTS BY COMBUSTION CREMATION FURNACES HEATING LIGHTING MECHANICAL ENGINEERING WEAPONS
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