PRETREATMENT APPARATUS FOR EXHAUST GAS FROM SEMICONDUCTOR MANUFACTURING PROCESS

PROBLEM TO BE SOLVED: To provide a pretreatment apparatus for an exhaust gas capable of assuring high pretreating efficiency. SOLUTION: An exhaust gas inlet 5 for introducing an exhaust gas, such as nitrogen trifluoride or the like, to be exhausted from a semiconductor manufacturing apparatus and an auxiliary gas inlet 6 for introducing an auxiliary gas, such as liquefied petroleum gas or the like are provided at the upper part of a vertically extended outer cylinder 1. The lower end of the cylinder 1 is open to the atmosphere, an inner cylinder 2 open at its upper end is projected into the cylinder 1 from the lower end opening of the cylinder 1, and a vent passage 8 is formed between the inner periphery of the cylinder 1 and the outer periphery of the cylinder 2. The lower part of the cylinder 2 communicates with a suction unit, such as a wet scrubber or the like, and a gas fuel burner 9 is disposed at a position of the cylinder 1 at a lower side of the inlets 5, 6 at the upper side of the upper end opening of the cylinder 2. A combustion area 10 by a burner flame of the burner 9 is formed in the cylinder 1, and a preheating area 12 is formed at an upper side of the area 10.