METHOD FOR PRODUCING GLASS-LIKE SILICA LAYER WITH INDUCTIVELY COUPLED PLASMA TORCH AND PRODUCTION DEVICE TO BE USED

PROBLEM TO BE SOLVED: To provide a production method and a production device for accumulating a silica layer doped with a pure or proper dopant on a flat target. SOLUTION: This production device is provided with an inductively coupled plasma.torch 1 and a nozzle 9 for supplying a gas into the touch...

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Bibliographische Detailangaben
1. Verfasser:	PANCIATICHI CRISTINA
Format:	Patent
Sprache:	eng
Schlagworte:	CHEMISTRY ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY GLASS MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES METALLURGY MINERAL OR SLAG WOOL PLASMA TECHNIQUE PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a production method and a production device for accumulating a silica layer doped with a pure or proper dopant on a flat target. SOLUTION: This production device is provided with an inductively coupled plasma.torch 1 and a nozzle 9 for supplying a gas into the touch 1. The nozzle 9 is connected to a reagent source, and a reagent is supplied into the nozzle 9 in a gaseous state. The nozzle 9 is disposed so that the reagent can be supplied into the tail of a plasma generated from a gas having a pressure approximately equal to the atmospheric pressure in a free atmosphere generated in the plasma torch 1. A target 2 is configured so as to be allowed to pass above the touch 1 on the production of the silica layer. Therein, the height position of the target can arbitrarily be changed.