INSPECTION OF SEMICONDUCTOR DEVICE

PROBLEM TO BE SOLVED: To certainly and efficiently discover the crack generated in the insulating film on the surface of a semiconductor device. SOLUTION: In a method for inspecting the presence of the crack in the insulating film 3 of a semiconductor device having the insulating film 3 applied to t...

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1. Verfasser: SHINOHARA MAMORU
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creator SHINOHARA MAMORU
description PROBLEM TO BE SOLVED: To certainly and efficiently discover the crack generated in the insulating film on the surface of a semiconductor device. SOLUTION: In a method for inspecting the presence of the crack in the insulating film 3 of a semiconductor device having the insulating film 3 applied to the surface thereof and having a conductive film 2 formed thereto under the insulating film 3, a conductive soln. 8 is brought into contact with the insulating film 3 and an electrode 81 is brought into contact with the conductive soln. 80 and the electric signal transmitted to the electrode 81 such as the current flowing across the electrode 81 and the conductive film 2 through the conductive soln. 80 is detected.
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subjects BASIC ELECTRIC ELEMENTS
DIAGNOSIS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
HUMAN NECESSITIES
HYGIENE
IDENTIFICATION
INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES
MEASURING
MEASURING ANGLES
MEASURING AREAS
MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS
MEDICAL OR VETERINARY SCIENCE
PHYSICS
SEMICONDUCTOR DEVICES
SURGERY
TESTING
title INSPECTION OF SEMICONDUCTOR DEVICE
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