DOUBLE-FACED POLISHING DEVICE AND SYSTEM FOR IT

PROBLEM TO BE SOLVED: To provide a double-faced polishing device assuring an enhanced mass-producibility and polishing accuracy and capable of preventing eccentric wear of a lower and an upper surface plate. SOLUTION: The arrangement according to the present invention includes a lower 1 and an upper...

Ausführliche Beschreibung

Bibliographische Detailangaben

1. Verfasser:	ARAI HATSUYUKI
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS DRESSING OR CONDITIONING OF ABRADING SURFACES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS GRINDING MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING PERFORMING OPERATIONS POLISHING SEMICONDUCTOR DEVICES TRANSPORTING
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