DEVICE AND METHOD FOR PRODUCTION OF OPTICAL WAVEGUIDE FILM

PROBLEM TO BE SOLVED: To uniformly maintain the surface temperature of a substrate on a table to a desired temperature by providing the table with a heating means to heat the substrate. SOLUTION: In order to form an optical waveguide film 2, Si and halides of Ge, B, P or the like are supplied to an...

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Bibliographische Detailangaben
Hauptverfasser: EJIMA MASAKI, MAKIKAWA SHINJI, KONISHI SHIGERU
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To uniformly maintain the surface temperature of a substrate on a table to a desired temperature by providing the table with a heating means to heat the substrate. SOLUTION: In order to form an optical waveguide film 2, Si and halides of Ge, B, P or the like are supplied to an oxyhydrogen frame burner 5 to synthesize glass fine particles essentially consisting of Si and containing Ge, B, P or the like as a dopant, and the product is sprayed onto the surface of a substrate 3 mounted in the center of a table 4. The table 4 houses a heating means 7 or is provided with a heating means under the table, and moves on the basis of a desired pattern in the X and Y axial directions, so that the relative position and velocity of the burner to the substrate 3 do not change in any position and that the surface temperature of the substrate 3 does not change by the movement of the table 4. Thereby, the surface temperature of the substrate can be uniformly maintained at a desired temperature, and a uniform optical waveguide film 2 having no irregularity in the dopant concentration in the thickness direction or plane direction of the deposited layer can be formed.