THIN-FILM PROCESSING METHOD AND LIQUID-CRYSTAL DISPLAY
PROBLEM TO BE SOLVED: To improve purity of a sample by eliminating the constraint on the pressure of gas for processing a sample, while promoting chemical reaction by generation of low molecular weight active species through gas decomposition. SOLUTION: A gas is introduced through a gas inlet 18, so...
Gespeichert in:
Hauptverfasser: | , |
---|---|
Format: | Patent |
Sprache: | eng |
Schlagworte: | |
Online-Zugang: | Volltext bestellen |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
Zusammenfassung: | PROBLEM TO BE SOLVED: To improve purity of a sample by eliminating the constraint on the pressure of gas for processing a sample, while promoting chemical reaction by generation of low molecular weight active species through gas decomposition. SOLUTION: A gas is introduced through a gas inlet 18, so that arc discharge is generated between an anode 24 and a cathode 22, to generate a plasma. An electron beam 34 is extracted from the plasma, and the electron beam 34 is guided into a reaction chamber 14 via a decompression chamber 12. The gas in the reaction chamber 14 is irradiated with electron beam 34 to generates a plasma 50, and a substrate 48 is processed with the plasma 50. |
---|