PHOTOSENSITIVE ELEMENT AND PRODUCTION OF COLOR FILTER USING THE SAME

PROBLEM TO BE SOLVED: To make suppressible the migration of a photopolymerizable compound and a photopolymerization initiator in a photosensitive resin composition layer to a cushion layer, to make the change of sensitivity slight and to produce a high precision pattern having little difference in l...

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Bibliographische Detailangaben
Hauptverfasser: YAMAZAKI HIROSHI, FURUBAYASHI HIROMI
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To make suppressible the migration of a photopolymerizable compound and a photopolymerization initiator in a photosensitive resin composition layer to a cushion layer, to make the change of sensitivity slight and to produce a high precision pattern having little difference in level with good productivity. SOLUTION: When a support film, a cushion layer and a photosensitive resin composition layer are successively laminated to obtain the photosensitive element, a fluorine compound having an alkyl group or a silicon compound having an alkyl group is incorporated into the cushion layer. The resulting photosensitive element is stuck to a transparent substrate in such a way that the photosensitive resin composition layer comes in contact with the top of the substrate, the support film and the cushion layer are removed and the photosensitive resin composition layer is patternwise exposed and developed. These steps are repeated to form a multicolor pattern.