PATTERN FORMING MATERIAL AND PATTERN FORMING METHOD USING THE SAME
PROBLEM TO BE SOLVED: To improve the exposure latitude of a negative type pattern forming material, to enhance the precision of micro-fabrication and to obtain a high resolution pattern. SOLUTION: When a coating film of the pattern forming material is patternwise irradiated, the solubility of the la...
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Zusammenfassung: | PROBLEM TO BE SOLVED: To improve the exposure latitude of a negative type pattern forming material, to enhance the precision of micro-fabrication and to obtain a high resolution pattern. SOLUTION: When a coating film of the pattern forming material is patternwise irradiated, the solubility of the latent image forming part in an aqueous alkali solution is varied and the coating film in the unirradiated part is thoroughly dissolved by development, the rate of a residual film in the irradiated part is >=70% of the thickness of the coating film. When the residual film is immersed in an aqueous solution containing 50% methanol, the rate of a residual film is >=50%. |
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