SIDEWALL REMOVING LIQUID

PROBLEM TO BE SOLVED: To provide a sidewall removing liquid which is capable of rapidly (within 60 minutes) removing the sidewalls generated at the time of dry etching in a semiconductor production stage at a low temperature (

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Bibliographische Detailangaben
Hauptverfasser:	SUGIYAMA TSUTOMU, MIYAHARA KUNIAKI, OGATA FUJIMARO
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a sidewall removing liquid which is capable of rapidly (within 60 minutes) removing the sidewalls generated at the time of dry etching in a semiconductor production stage at a low temperature (