POLISHING DEVICE AND POLLSHING METHOD

PROBLEM TO BE SOLVED: To eliminate the necessity of replacement of retainer rings each time when a workpiece is replaced with another. SOLUTION: In a polishing machine, when a rotary table 27 is rotated to polish a workpiece 21 with a polishing pad 21 set on the table 27, the workpiece held by a wor...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
1. Verfasser:	OTSUKA KYO
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS DRESSING OR CONDITIONING OF ABRADING SURFACES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS GRINDING MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING PERFORMING OPERATIONS POLISHING SEMICONDUCTOR DEVICES TRANSPORTING
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To eliminate the necessity of replacement of retainer rings each time when a workpiece is replaced with another. SOLUTION: In a polishing machine, when a rotary table 27 is rotated to polish a workpiece 21 with a polishing pad 21 set on the table 27, the workpiece held by a workpiece holder 22 is pressed against the polishing pad 25 by means of a first pressing means 210 while a retaining ring is positioned so as to surround the entire periphery of the workpiece 21 is pressed by an independent second pressing means 220. With this arrangement, even after the retaining ring 23 is worn through polishing, the retaining ring 23 can be still pressed against the polishing pad 25.