OFF-AXIS LEVELING IN LITHOGRAPHIC PROJECTION APPARATUS

PROBLEM TO BE SOLVED: To avoid for the necessity to relate origins of two interferometer systems by controlling position of a second substrate table in a first direction in accordance with a height map and a measured position, during exposure of a target portion of a substrate. SOLUTION: A projectio...

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Hauptverfasser:	LOOPSTRA ERIK ROELOF, HEUTS FREDERIK THEODORUS E, JASPER JOHANNES CHRISTIAAN MARIA, MODDERMAN THEODORUS MARINUS, DU CROO DE JONGH RICHARD JOHAN H, BOONMAN MARCUS EMILE JOANNES, VAN ASTEN NICOLAAS ANTONIUS A J, CASTENMILLER THOMAS JOSEPHUS M, GEMEN JACOBUS, KLINKHAMER JACOB FREDRIK FRISO, NIJMEIJER GERRIT JOHANNES
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR MEASURING MEASURING ANGLES MEASURING AREAS MEASURING IRREGULARITIES OF SURFACES OR CONTOURS MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES TESTING
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Zusammenfassung:	PROBLEM TO BE SOLVED: To avoid for the necessity to relate origins of two interferometer systems by controlling position of a second substrate table in a first direction in accordance with a height map and a measured position, during exposure of a target portion of a substrate. SOLUTION: A projection beam PB of radiation is supplied from a radiation system A to a mask MA, which is held with a first substrate table MT. An irradiated portion of a mask of a second substrate table WT is imaged on a target portion C of a substrate W by using a projection system PL. Position of the second substrate table WT in a first direction is controlled in accordance with a position measured with a height map and a position measuring means IF, during exposure of the target portion C of the substrate W. As a result, necessity to relate origins of two interferometer systems can be evaded.