FEEDING SYSTEM FOR SEMICONDUCTOR PROCESS GAS

PROBLEM TO BE SOLVED: To provide a compact semiconductor process gas feeding system with substantially improved performance of puring in a gas feeding system and safety, by reducing high-pressure regions and risk of leakages. SOLUTION: A container unit 10 as a block made up of a shut-off valve on th...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: HANESAKA SATOSHI, SHIGETA KENJI
Format: Patent
Sprache:eng
Schlagworte:
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