FEEDING SYSTEM FOR SEMICONDUCTOR PROCESS GAS

PROBLEM TO BE SOLVED: To provide a compact semiconductor process gas feeding system with substantially improved performance of puring in a gas feeding system and safety, by reducing high-pressure regions and risk of leakages. SOLUTION: A container unit 10 as a block made up of a shut-off valve on th...

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Bibliographische Detailangaben
Hauptverfasser:	HANESAKA SATOSHI, SHIGETA KENJI
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS BLASTING ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED,LIQUEFIED, OR SOLIDIFIED GASES FIXED-CAPACITY GAS-HOLDERS HEATING LIGHTING MECHANICAL ENGINEERING SEMICONDUCTOR DEVICES STORING OF DISTRIBUTING GASES OR LIQUIDS VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED ORSOLIDIFIED GASES WEAPONS
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a compact semiconductor process gas feeding system with substantially improved performance of puring in a gas feeding system and safety, by reducing high-pressure regions and risk of leakages. SOLUTION: A container unit 10 as a block made up of a shut-off valve on the container side, a reducing value for reducing the gas pressure to 1 Mpa of lower, and a purge gas feeding path 13 has a container valve 12 with reduced pressure function. The container unit 10 and a feeding unit 20, having a feeding valve 222 on the gas tube joining side of the consuming position of the semiconductor process gas and a gas discharging path for discharging the gas in the gas feeding system on the primary side of the feeding valve, are joined detachably at the joining part 15.