FEEDING SYSTEM FOR SEMICONDUCTOR PROCESS GAS
PROBLEM TO BE SOLVED: To provide a compact semiconductor process gas feeding system with substantially improved performance of puring in a gas feeding system and safety, by reducing high-pressure regions and risk of leakages. SOLUTION: A container unit 10 as a block made up of a shut-off valve on th...
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| creator | HANESAKA SATOSHI SHIGETA KENJI |
| description | PROBLEM TO BE SOLVED: To provide a compact semiconductor process gas feeding system with substantially improved performance of puring in a gas feeding system and safety, by reducing high-pressure regions and risk of leakages. SOLUTION: A container unit 10 as a block made up of a shut-off valve on the container side, a reducing value for reducing the gas pressure to 1 Mpa of lower, and a purge gas feeding path 13 has a container valve 12 with reduced pressure function. The container unit 10 and a feeding unit 20, having a feeding valve 222 on the gas tube joining side of the consuming position of the semiconductor process gas and a gas discharging path for discharging the gas in the gas feeding system on the primary side of the feeding valve, are joined detachably at the joining part 15. |
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| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_JP2000306839A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>JP2000306839A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_JP2000306839A3</originalsourceid><addsrcrecordid>eNrjZNBxc3V18fRzVwiODA5x9VVw8w9SCHb19XT293MJdQ4B8gKC_J1dg4MV3B2DeRhY0xJzilN5oTQ3g5Kba4izh25qQX58anFBYnJqXmpJvFeAkYGBgbGBmYWxpaMxUYoA7cYlvA</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>FEEDING SYSTEM FOR SEMICONDUCTOR PROCESS GAS</title><source>esp@cenet</source><creator>HANESAKA SATOSHI ; SHIGETA KENJI</creator><creatorcontrib>HANESAKA SATOSHI ; SHIGETA KENJI</creatorcontrib><description>PROBLEM TO BE SOLVED: To provide a compact semiconductor process gas feeding system with substantially improved performance of puring in a gas feeding system and safety, by reducing high-pressure regions and risk of leakages. SOLUTION: A container unit 10 as a block made up of a shut-off valve on the container side, a reducing value for reducing the gas pressure to 1 Mpa of lower, and a purge gas feeding path 13 has a container valve 12 with reduced pressure function. The container unit 10 and a feeding unit 20, having a feeding valve 222 on the gas tube joining side of the consuming position of the semiconductor process gas and a gas discharging path for discharging the gas in the gas feeding system on the primary side of the feeding valve, are joined detachably at the joining part 15.</description><edition>7</edition><language>eng</language><subject>BASIC ELECTRIC ELEMENTS ; BLASTING ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED,LIQUEFIED, OR SOLIDIFIED GASES ; FIXED-CAPACITY GAS-HOLDERS ; HEATING ; LIGHTING ; MECHANICAL ENGINEERING ; SEMICONDUCTOR DEVICES ; STORING OF DISTRIBUTING GASES OR LIQUIDS ; VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED ORSOLIDIFIED GASES ; WEAPONS</subject><creationdate>2000</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20001102&DB=EPODOC&CC=JP&NR=2000306839A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25543,76293</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20001102&DB=EPODOC&CC=JP&NR=2000306839A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>HANESAKA SATOSHI</creatorcontrib><creatorcontrib>SHIGETA KENJI</creatorcontrib><title>FEEDING SYSTEM FOR SEMICONDUCTOR PROCESS GAS</title><description>PROBLEM TO BE SOLVED: To provide a compact semiconductor process gas feeding system with substantially improved performance of puring in a gas feeding system and safety, by reducing high-pressure regions and risk of leakages. SOLUTION: A container unit 10 as a block made up of a shut-off valve on the container side, a reducing value for reducing the gas pressure to 1 Mpa of lower, and a purge gas feeding path 13 has a container valve 12 with reduced pressure function. The container unit 10 and a feeding unit 20, having a feeding valve 222 on the gas tube joining side of the consuming position of the semiconductor process gas and a gas discharging path for discharging the gas in the gas feeding system on the primary side of the feeding valve, are joined detachably at the joining part 15.</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>BLASTING</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED,LIQUEFIED, OR SOLIDIFIED GASES</subject><subject>FIXED-CAPACITY GAS-HOLDERS</subject><subject>HEATING</subject><subject>LIGHTING</subject><subject>MECHANICAL ENGINEERING</subject><subject>SEMICONDUCTOR DEVICES</subject><subject>STORING OF DISTRIBUTING GASES OR LIQUIDS</subject><subject>VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED ORSOLIDIFIED GASES</subject><subject>WEAPONS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2000</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZNBxc3V18fRzVwiODA5x9VVw8w9SCHb19XT293MJdQ4B8gKC_J1dg4MV3B2DeRhY0xJzilN5oTQ3g5Kba4izh25qQX58anFBYnJqXmpJvFeAkYGBgbGBmYWxpaMxUYoA7cYlvA</recordid><startdate>20001102</startdate><enddate>20001102</enddate><creator>HANESAKA SATOSHI</creator><creator>SHIGETA KENJI</creator><scope>EVB</scope></search><sort><creationdate>20001102</creationdate><title>FEEDING SYSTEM FOR SEMICONDUCTOR PROCESS GAS</title><author>HANESAKA SATOSHI ; SHIGETA KENJI</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JP2000306839A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2000</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>BLASTING</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED,LIQUEFIED, OR SOLIDIFIED GASES</topic><topic>FIXED-CAPACITY GAS-HOLDERS</topic><topic>HEATING</topic><topic>LIGHTING</topic><topic>MECHANICAL ENGINEERING</topic><topic>SEMICONDUCTOR DEVICES</topic><topic>STORING OF DISTRIBUTING GASES OR LIQUIDS</topic><topic>VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED ORSOLIDIFIED GASES</topic><topic>WEAPONS</topic><toplevel>online_resources</toplevel><creatorcontrib>HANESAKA SATOSHI</creatorcontrib><creatorcontrib>SHIGETA KENJI</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>HANESAKA SATOSHI</au><au>SHIGETA KENJI</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>FEEDING SYSTEM FOR SEMICONDUCTOR PROCESS GAS</title><date>2000-11-02</date><risdate>2000</risdate><abstract>PROBLEM TO BE SOLVED: To provide a compact semiconductor process gas feeding system with substantially improved performance of puring in a gas feeding system and safety, by reducing high-pressure regions and risk of leakages. SOLUTION: A container unit 10 as a block made up of a shut-off valve on the container side, a reducing value for reducing the gas pressure to 1 Mpa of lower, and a purge gas feeding path 13 has a container valve 12 with reduced pressure function. The container unit 10 and a feeding unit 20, having a feeding valve 222 on the gas tube joining side of the consuming position of the semiconductor process gas and a gas discharging path for discharging the gas in the gas feeding system on the primary side of the feeding valve, are joined detachably at the joining part 15.</abstract><edition>7</edition><oa>free_for_read</oa></addata></record> |
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| language | eng |
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| subjects | BASIC ELECTRIC ELEMENTS BLASTING ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED,LIQUEFIED, OR SOLIDIFIED GASES FIXED-CAPACITY GAS-HOLDERS HEATING LIGHTING MECHANICAL ENGINEERING SEMICONDUCTOR DEVICES STORING OF DISTRIBUTING GASES OR LIQUIDS VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED ORSOLIDIFIED GASES WEAPONS |
| title | FEEDING SYSTEM FOR SEMICONDUCTOR PROCESS GAS |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-23T23%3A16%3A00IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=HANESAKA%20SATOSHI&rft.date=2000-11-02&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EJP2000306839A%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |