FORMATION OF PHOTOCATALYST FILM

PROBLEM TO BE SOLVED: To form a photocatalyst film having high activity and high film strength at low temperature. SOLUTION: A substrate 8 consisting of plastic, etc., is fixed to a substrate holder 7 and a raw material 5 for vapor deposition consisting of metallic material is put into a crucible. T...

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Bibliographische Detailangaben
Hauptverfasser:	NOSAKA TOSHINORI, OGAWA SOICHI, CHIBA SHINOBU, MATSUOKA NORIHIRO, MOTOKI AKIRA, TAKAHASHI MIKIO, OKAMOTO AKIO
Format:	Patent
Sprache:	eng
Schlagworte:	CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY PERFORMING OPERATIONS PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL SEPARATION SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION THEIR RELEVANT APPARATUS TRANSPORTING
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To form a photocatalyst film having high activity and high film strength at low temperature. SOLUTION: A substrate 8 consisting of plastic, etc., is fixed to a substrate holder 7 and a raw material 5 for vapor deposition consisting of metallic material is put into a crucible. The substrate 8 is irradiated with mixed excitation rays of oxygen ions, oxygen radical and oxygen plasma from an excitation ray source 6. The raw material 5 for vapor deposition 5 is heated by casting electron beams 4 thereto simultaneously therewith, by which the raw material is evaporated and is adhered onto the substrate 8 to form a metal oxide and the photocatalyst film is thus formed.