MAGNESIUM OXIDE FILM FOR ALTERNATING CURRENT TYPE PLASMA DISPLAY PANEL, AND MANUFACTURE THEREOF, AND ALTERNATING CURRENT TYPE PLASMA DISPLAY PANEL AND DEVICE

PROBLEM TO BE SOLVED: To provide a film capable of restricting the adsorption of the impurity gas as a protecting film by controlling the oxygen partial pressure in a specified range and board temperature at the specified value or less at the time of forming a magnesium oxide film on a board with el...

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Bibliographische Detailangaben
Hauptverfasser:	SAWADA TAKAO, KAWAKUSU HIDE
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUSENAMELS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY GLASS INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL JOINING GLASS TO GLASS OR OTHER MATERIALS METALLURGY MINERAL OR SLAG WOOL SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS,MINERALS OR SLAGS SURFACE TREATMENT OF GLASS SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a film capable of restricting the adsorption of the impurity gas as a protecting film by controlling the oxygen partial pressure in a specified range and board temperature at the specified value or less at the time of forming a magnesium oxide film on a board with electron beam deposition. SOLUTION: Oxygen partial pressure is set at 1×10-5-1×10-4 Torr, and board temperature is set at 250 deg.C or more. A discharge sustain electrode 10 and a dielectric layer 2 are formed on a front glass board 1 of a front panel 21 of an alternating current type plasma display panel, and set in an electron beam deposition device. The electron beam deposition device is evacuated, and the front glass board 1 is heated by an infrared heating device. When degree of vacuum achieves the predetermined value, oxygen gas is added at the predetermined value of pressure, and the MgO raw material is dissolved by the electron beam so as to start the deposition. The front glass board 1 is heated at a high temperature more than the predetermined value, and a protecting film 3 of MgO having several thousands angstrom of thickness is deposited onto the dielectric layer 2.