SPIN CLEANER

PROBLEM TO BE SOLVED: To clean both the surfaces and the outer peripheral side of a work such as a wafer without breaking it, even if it is thin, in a spinner cleaner which supports the center of the work and cleaning it with cleaning water, while rotating it. SOLUTION: A spin cleaner includes a spi...

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1. Verfasser: SATO KICHIZO
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To clean both the surfaces and the outer peripheral side of a work such as a wafer without breaking it, even if it is thin, in a spinner cleaner which supports the center of the work and cleaning it with cleaning water, while rotating it. SOLUTION: A spin cleaner includes a spinner table 30 capable of holding a wafer and rotating at high speeds, a cleaning water supply device for supplying cleaning water to the wafer, a first brush 32 which is selectively positioned at an operating position and a non-operating position and whose top surface is flush with the top surface of the spinner table 30 around the spinner table 30 at the operating position, and a second brush 33, which is located opposite to the first brush 32 and is selectively positioned at an operating position and a non-operating position and whose surface, is in contact with the top surface of the wafer at the operating position. The spinner table 30 and the first brush 32 support the wafer, and the first and second brushes 32, 33 clean both the surfaces and the outer peripheral side of the wafer with the cleaning water.