COMPOSITION FOR SKIN LOTION

PROBLEM TO BE SOLVED: To produce a composition for skin lotion such as cosmetic or pharmaceutical for skin lotion, having stable system and excellent safety, free from nonionic surfactant and suitable for the conditioning of skin by including a mucopolysaccharide having sulfate group and a polymer h...

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Bibliographische Detailangaben
1. Verfasser: TAKATORI MASAHARU
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To produce a composition for skin lotion such as cosmetic or pharmaceutical for skin lotion, having stable system and excellent safety, free from nonionic surfactant and suitable for the conditioning of skin by including a mucopolysaccharide having sulfate group and a polymer having an alkyl group. SOLUTION: The objective composition contains (A) one or more kinds of mucopolysaccharide having sulfate group (chondroitin sulfates such as chondroitin sulfate and dermatan sulfate, heparins or heparin-analog substances such as keratan sulfate and chondroitin polysulfate, etc.), and (B) a polymer having an alkyl group [e.g. an alkyl (meth)acrylate copolymer]. The composition is preferably further incorporated with (C) an unsaturated higher alcohol ether of a polyhydric alcohol (e.g. glycerol). Preferable content of each component is 0.001-10 wt.%, especially 0.05-5 wt.% for the component A, 0.01-2 wt.%, especially 0.05-1 wt.% for the component B and 0.01-5 wt.%, especially 0.1-3 wt.% for the component C.