PLASMA REACTION CHAMBER HAVING EROSION RESISTANT SCREW

PROBLEM TO BE SOLVED: To provide an easy-to-manufacture plasma erosion screw and a plasma reaction chamber having such a screw. SOLUTION: A system for processing a wafer utilizing erosive plasma under an environment where contamination is controlled comprises a reaction chamber for containing a wafe...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: RI KINZUI, JO BUTATSU, BOU TOKUKUN, RI HAKUSHO
Format: Patent
Sprache:eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:PROBLEM TO BE SOLVED: To provide an easy-to-manufacture plasma erosion screw and a plasma reaction chamber having such a screw. SOLUTION: A system for processing a wafer utilizing erosive plasma under an environment where contamination is controlled comprises a reaction chamber for containing a wafer to be processed and isolating the wafer from externally intruding contaminants during processing, and one or more of a plasma erosion resistant screw 200 having a threaded shaft 235 and an enlarged screw head 237. The threaded shaft 235 is secured in the reaction chamber so that it is not exposed to plasma and the screw head 237 is formed of same material as the threaded shaft 235 integrally therewith. It has continuously recessed shape and the number of edges is decreased in order to reduce storage of charge and plasma erosion resistance is imparted thereto.