SUBSTRATE TREATING DEVICE AND SUBSTRATE TREATMENT

PROBLEM TO BE SOLVED: To eliminate the trouble due to the abnormal transport of a mount while a substrate is transported and to obtain a good substrate to be treated in good yield. SOLUTION: This substrate treating device has at least a substrate delivering chamber, in which a mount from a substrate...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: YOSHISATO SUNAO, MORIYAMA KOUICHIROU, SHIMODA HIROTSUGU, OTOSHI HIROKAZU, KANAI MASAHIRO
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:PROBLEM TO BE SOLVED: To eliminate the trouble due to the abnormal transport of a mount while a substrate is transported and to obtain a good substrate to be treated in good yield. SOLUTION: This substrate treating device has at least a substrate delivering chamber, in which a mount from a substrate delivering bobbin 105 having a roller on which a strip substrate 102 and the mount 103 are alternately wound is wound on a mount winding bobbin, and the strip substrate is continuously delivered, a substrate treating chamber for treating the substrate, and a substrate winding chamber 101 for winding the substrate and the mount delivered from a mount delivering bobbin on the substrate winding bobbin. Further, at least either one of a mechanism for detecting the abnormal transport of the mount in the substrate delivering chamber and a mechanism for detecting the abnormal transport of the mount in the substrate winding chamber is provided to the device.