MANUFACTURE OF MULTISTAGE STRUCTURE USING EMBEDDED ETCHING STOPPING LAYER

PROBLEM TO BE SOLVED: To manufacture a multistage fine lithographic structure, such as a Fresnel lens for acoustic ink printing which is economical with high reliability. SOLUTION: Layers 602, 606, 610 of SiON as a Fresnel lens material are deposited by a known method and the chemical composition fo...

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Bibliographische Detailangaben
Hauptverfasser:	JAMES C MICHAELSON JR, MARTIN G RIMU, SMITH DONALD L, HADIMIOGLU BABUR B
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To manufacture a multistage fine lithographic structure, such as a Fresnel lens for acoustic ink printing which is economical with high reliability. SOLUTION: Layers 602, 606, 610 of SiON as a Fresnel lens material are deposited by a known method and the chemical composition for depositing material is selectively altered to form middle etching stopping layers 604, 608 at appropriate positions. The depositing process is not interrupted for the end half process. The objective multistage structure, that is, a Fresnel lens is then formed by masking, patterning and etching. Desired uniformity is easily obtained, unequal stage heights are allowed and the degree of requirements to the selectivity of regions to be etched, and the thickness of etching stopping layers can be relieved.