CARBON FILM OF HIGH ORIENTATION AND ITS PRODUCTION
PROBLEM TO BE SOLVED: To obtain a carbon film of high orientation by forming the carbon film in which faces of graphite layers perpendicular to the C-axis are strongly oriented. SOLUTION: This carbon film is preferably formed on the surface of a base body and has graphite layers perpendicular to the...
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Zusammenfassung: | PROBLEM TO BE SOLVED: To obtain a carbon film of high orientation by forming the carbon film in which faces of graphite layers perpendicular to the C-axis are strongly oriented. SOLUTION: This carbon film is preferably formed on the surface of a base body and has graphite layers perpendicular to the C-axis which are strongly oriented to the base body surface. The X-ray diffraction analysis (CuKα 20θ) of the film formed on the base body shows relatively strong peak intensities at (100) and (110) which means orientation along the plane direction of the graphite layers perpendicular to the C-axis, and the high orientation carbon film is formed by a plasma CVD method or ECR plasma CVD method. In the producing method of the high orientation carbon film, the carbon film is formed from a gas source material containing a hydrocarbon gas and oxygen and/or hydrogen on a base body by a ECR plasma CVD method in such a manner that the graphite layer faces perpendicular to the C-axis are highly oriented to the base body. By using the ECR plasma CVD method, the high orientation carbon film can be formed in a large area at a low temperature. |
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