COATING FORMATION METHOD

PROBLEM TO BE SOLVED: To obtain a method for forming a coating with low dielectric constant. SOLUTION: A solution containing at least two resins containing an Si-H group and a solvent is deposited on a substrate, so that at least 5 vol.% solvent remains in coating after being deposited on the substr...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: CHUNG KYUHA, MOYER ERIC SCOTT, SPAULDING MICHAEL JOHN
Format: Patent
Sprache:eng
Schlagworte:
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