COATING FORMATION METHOD

PROBLEM TO BE SOLVED: To obtain a method for forming a coating with low dielectric constant. SOLUTION: A solution containing at least two resins containing an Si-H group and a solvent is deposited on a substrate, so that at least 5 vol.% solvent remains in coating after being deposited on the substr...

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Bibliographische Detailangaben
Hauptverfasser:	CHUNG KYUHA, MOYER ERIC SCOTT, SPAULDING MICHAEL JOHN
Format:	Patent
Sprache:	eng
Schlagworte:	AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F,C08G APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL ARTIFICIAL STONE BASIC ELECTRIC ELEMENTS CEMENTS CERAMICS CHEMISTRY COMPOSITIONS BASED THEREON COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDINGMATERIALS CONCRETE ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY GENERAL PROCESSES OF COMPOUNDING LAYERED PRODUCTS LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT ORNON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM LIME, MAGNESIA METALLURGY ORGANIC MACROMOLECULAR COMPOUNDS PERFORMING OPERATIONS PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL REFRACTORIES SEMICONDUCTOR DEVICES SLAG SPRAYING OR ATOMISING IN GENERAL THEIR PREPARATION OR CHEMICAL WORKING-UP TRANSPORTING TREATMENT OF NATURAL STONE WORKING-UP
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To obtain a method for forming a coating with low dielectric constant. SOLUTION: A solution containing at least two resins containing an Si-H group and a solvent is deposited on a substrate, so that at least 5 vol.% solvent remains in coating after being deposited on the substrate, a coating that is obtained after that is exposed to an environment containing a base catalyst with sufficient concentration for condensing the Si-H group and water, and the coating is formed on the substrate which contains formation on the coating and has a porous net-shaped structure by depositing the solvent from the coating. This method is especially useful for executing coating a low dielectric constant to an electronic device.