DEVICE FOR HOLDING LENS

PROBLEM TO BE SOLVED: To coat sufficiently uniform even in using a facility where a covering source is not arranged at the center below a substrate support body, but arranged outside the center, i.e., aside the axis of rotation of an umbrella-shaped substrate body. SOLUTION: Centering holes which ar...

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Bibliographische Detailangaben
Hauptverfasser:	GRIES HERBERT, LOCHER STEFAN
Format:	Patent
Sprache:	eng
Schlagworte:	CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUSENAMELS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL GLASS INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL JOINING GLASS TO GLASS OR OTHER MATERIALS METALLURGY MINERAL OR SLAG WOOL SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS,MINERALS OR SLAGS SURFACE TREATMENT OF GLASS SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To coat sufficiently uniform even in using a facility where a covering source is not arranged at the center below a substrate support body, but arranged outside the center, i.e., aside the axis of rotation of an umbrella-shaped substrate body. SOLUTION: Centering holes which are provided in a substrate holder 4 and surrounds a cylindrical circumferential edge part of lenses 3 and 3' are positionally adjusted approximately toward a covering source, the center perpendicular line M of the longitudinal axis A of each hole is intersected with the axis R of rotation of the substrate holder 4 at a specified point O, the point O is located approximately at the center between two intersections C and F of perpendicular axes M' and M" of two imaginary holes of a partial circle T having the longitudinal axis across the covering source with the axis R of rotation. However, one imaginary hole has a maximum space to the covering source, while the other imaginary hole has a minimum space to the covering source Q.