PRODUCTION AND PRODUCTION DEVICE FOR METALLIC VAPOR- DEPOSITED FILM

PROBLEM TO BE SOLVED: To provide a method and a device for producing a metallic vapor- deposited film by which metal is vapor-deposited at a high speed without causing any defect due to the deficiency of a masking agent even in the case of a geometrically patterned mask with the necessary amt. of th...

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Bibliographische Detailangaben
Hauptverfasser: UEDA YUKINORI, TANAKA NORIO, KUROKI NOBUYUKI, TSUTSUMIDA YUJI, HIGASHIDA YOSHIHISA
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide a method and a device for producing a metallic vapor- deposited film by which metal is vapor-deposited at a high speed without causing any defect due to the deficiency of a masking agent even in the case of a geometrically patterned mask with the necessary amt. of the masking agent different between the traveling direction and width direction of the film. SOLUTION: A mask pattern forming means consisting of a rotating masking agent depositing roller 2a and a mask forming roller 1 rotating in contact with the roller 2a, brought into contact with a traveling film and with a specified mask pattern formed on the surface and a means for forming a metallic vapor-deposited film on the traveling film are used in the metallic vapor- deposited film forming method and device. In this case, the surface of the roller 2a is formed with an impregnated layer with an agent capable of holding the masking agent, the roller 2a is oscillated in the axial direction, or the inside of the roller 2a is forcedly cooled.