METHOD AND DEVICE FOR ETCHING SEMICONDUCTOR SUBSTRATE

PROBLEM TO BE SOLVED: To provide a method and device for etching a substrate, wherein constant etching is provided. SOLUTION: An etching vessel 1 where an etchant 2 is housed, and a substrate holding device which is fixed/held in the etching vessel while an etching surface 3a of a substrate 3 facing...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	NAKAOKA YASUYUKI, YAMADA TOMOKO
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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