RESIST SOLUTION AND FORMATION OF PATTERN

PROBLEM TO BE SOLVED: To obtain a method for forming a pattern, which surely forms a pattern having a stencil shape by a simple method, without being effected due to exposure systems, a high-step substrate, or a resist solution, which is used for the method. SOLUTION: A first resist solution formed...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	ODAKA ISAMU, MEIKE KUNIHIKO, AKAGE YUICHI
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
Online-Zugang:	Volltext bestellen
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