LITHOGRAPHIC PROCESS FOR MANUFACTURING DEVICE USING ELECTRON BEAM IMAGING

PROBLEM TO BE SOLVED: To form a jointless image from a plurality of patterned portions by adjusting the radiation dose used for irradiating a pattern copied in adjacent segments so that the twice imaging of the pattern may be effective. SOLUTION: Two segments 401 and 402 are individually scanned to...

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Bibliographische Detailangaben
Hauptverfasser:	FELKER JOSEPH A, LIDDLE JAMES A, STANTON STUART THOMAS
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To form a jointless image from a plurality of patterned portions by adjusting the radiation dose used for irradiating a pattern copied in adjacent segments so that the twice imaging of the pattern may be effective. SOLUTION: Two segments 401 and 402 are individually scanned to generate an adjacent pattern 405 and the image 405 is obtained by making the image of the segment 401 to adjoin to the image of the segment 402. Trapezoids 407 and 408 show a radiation dose profile covering the segments 401 and 402. Namely, redundant pattern information is superposed upon the inclined portions of the trapezoids 407 and 408 and inclined radiation dose profiles are provided on the redundant pattern information. Because of the inclined radiation dose profiles, the total radiation dose profile becomes nearly equal to the radiation dose profile on the non-redundant portions of the segments 401 and 402.