METHOD FOR DIMINISHING GAS RELEASED FROM MATERIAL FOR VACUUM DEPOSITION

PROBLEM TO BE SOLVED: To diminish gas released from an MgO evaporating material used for vacuum deposition in a vacuum deposition apparatus and to shorten the time required to evacuate the vacuum deposition apparatus by pretreating the MgO evaporating material. SOLUTION: Gas in an MgO evaporating ma...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	KURAUCHI TOSHIHARU, HAKOMORI MUNEHITO, MATSUZAKI KANENORI
Format:	Patent
Sprache:	eng
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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