METHOD FOR DIMINISHING GAS RELEASED FROM MATERIAL FOR VACUUM DEPOSITION

PROBLEM TO BE SOLVED: To diminish gas released from an MgO evaporating material used for vacuum deposition in a vacuum deposition apparatus and to shorten the time required to evacuate the vacuum deposition apparatus by pretreating the MgO evaporating material. SOLUTION: Gas in an MgO evaporating ma...

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Bibliographische Detailangaben
Hauptverfasser:	KURAUCHI TOSHIHARU, HAKOMORI MUNEHITO, MATSUZAKI KANENORI
Format:	Patent
Sprache:	eng
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To diminish gas released from an MgO evaporating material used for vacuum deposition in a vacuum deposition apparatus and to shorten the time required to evacuate the vacuum deposition apparatus by pretreating the MgO evaporating material. SOLUTION: Gas in an MgO evaporating material used for vacuum deposition is released by a means such as acid washing, acid washing and vacuum heating or heating in the air before housing in a vacuum deposition apparatus. The time required to evacuate the vacuum deposition apparatus is shortened and the deterioration of the quality of a formed MgO film can be prevented.