MANUFACTURE OF SEMICONDUCTOR DEVICE

PROBLEM TO BE SOLVED: To provide a method for manufacturing semiconductor device for making further minuteness without causing degrading of reliability. SOLUTION: A process where a plurality of wirings, wherein a first insulating film is formed on the upper surface and the side surface, are formed o...

Ausführliche Beschreibung

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Bibliographische Detailangaben
1. Verfasser: MIZUTANI TAKAHIKO
Format: Patent
Sprache:eng
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