LITHOGRAPHIC PROJECTOR

PROBLEM TO BE SOLVED: To provide a scan type lithographic projector usable for manufacturing ICs, etc., wherein the exposure error of the projector occurs at the start and end of scan due to the reflection from a reticle mask blade and hence this is improved to make the slit illumination const. and...

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Bibliographische Detailangaben
Hauptverfasser:	VAN DER LEI SCHUBE ABRAHAM HARTMANN, BONNEMA GERRIT MAARTEN, CORBEIJ WILHELMUS MARIA, DE LEEUW RARD WILLEM
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a scan type lithographic projector usable for manufacturing ICs, etc., wherein the exposure error of the projector occurs at the start and end of scan due to the reflection from a reticle mask blade and hence this is improved to make the slit illumination const. and uniform over the entire scan. SOLUTION: A controller 11 controls the opening-closing of a slit defined by a reticle mask blade 7. A part of light beam emitted from a light source 1 is picked up and detected by a sensor 6 and a lamp controller 10 adjusts so that the illumination intensity of the slit is const. The controllers 10, 11 are interlocked to compensate the illumination intensity increase when the mask blade 7 opens. The mask blade 7 is made of a transparent material and provided with a total reflector at the top end or a reflective film on the back surface to prevent the reflection to a reticle 8.