METAL MASK

PROBLEM TO BE SOLVED: To provide a metal mask provided with a means for preventing electrostatic discharge generated in the space between a metal mask 2 and a substrate 5 to be worked, on the side of the metal mask 1. SOLUTION: This metal mask is provided with a mask main body 2, one or more opening...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: SUGITANI SATOYUKI, SASAKI HIROSHI, HIROSHIMA MINORU, ISODA TAKASHI
Format: Patent
Sprache:eng
Schlagworte:
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Beschreibung
Zusammenfassung:PROBLEM TO BE SOLVED: To provide a metal mask provided with a means for preventing electrostatic discharge generated in the space between a metal mask 2 and a substrate 5 to be worked, on the side of the metal mask 1. SOLUTION: This metal mask is provided with a mask main body 2, one or more opening window patterns 3 provided in the mask main body 2, a frame- shaped half etching region 6 provided on the whole peripheral part of each opening window pattern 3 and formed so as to be made thinner than the mask main body 2, and an insulating film 4 covering the end edge part of the opening window pattern 3 of each half etching region 6 and the vicinity thereof. In this constitution, since the place of the metal mask 1 where electrostatic discharge is most easily generated, i.e., the end edge part of the opening window pattern 3 of the half etching region in the whole peripheral part of the opening window pattern 3 provided in the mask main body 2 and the vicinity are respectively covered with the insulating film 4, electrostatic discharge generated in the space between the metal mask 1 and the substrate 5 to be worked can effectively be prevented.