MANUFACTURE OF OXY SILICON CARBIDE HYDRIDE FILM HAVING LOW DIELECTRIC CONSTANT

PROBLEM TO BE SOLVED: To obtain a method for manufacturing a low-dielectric-constant thin film of oxy silicon carbide hydride through chemical deposition. SOLUTION: This method for manufacturing an oxy silicon carbide hydride film comprises a step of introducing a reactive gas mixture of methyl-cont...

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Bibliographische Detailangaben
Hauptverfasser:	LOBODA MARK JON, SEIFFERLY JEFFREY ALAN
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS CABLES CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL COMPOUNDS THEREOF CONDUCTORS DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL INORGANIC CHEMISTRY INSULATORS METALLURGY NON-METALLIC ELEMENTS SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING ORDIELECTRIC PROPERTIES SEMICONDUCTOR DEVICES SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To obtain a method for manufacturing a low-dielectric-constant thin film of oxy silicon carbide hydride through chemical deposition. SOLUTION: This method for manufacturing an oxy silicon carbide hydride film comprises a step of introducing a reactive gas mixture of methyl-containing silane and an oxygen application gas into a chemical deposition chamber having a substrate placed therein, causing a reaction of the methyl-containing silane and oxygen application gas at a temperature of 25-500 deg.C and adjusting the amount of oxygen present in the reaction to form a film having a dielectric constant of 3.6 or less and containing hydrogen, silicon and oxygen on the substrate.