EXPOSURE METHOD AND LITHOGRAPHY SYSTEM

PROBLEM TO BE SOLVED: To enable a superposition exposure process of high superposition accuracy to be carried out using projection exposure systems. SOLUTION: This exposure method is carried out in a manner in which a projection exposure system that is ensured of a high superposition accuracy is selected, knowing the deformation of the transferred images of layers and taking the deformation controlling capacities of projection exposure systems 1101 to 110N into consideration, on the basis of an exposure history which indicates that photoreceptive substrates which are to be subjected to superposition exposure and possessed of at least one or more exposed photoreceptive layers are exposed to light as projection images are deformed by the use of the projection exposure systems 1101 to 110N. The photoreceptive substrates are subjected to a superposition exposure process using the selected projection exposure system. Therefore, a superposition exposure process of high superposition accuracy can be carried out using the projection exposure systems 1101 to 110N.