THIN-FILM MAGNETIC HEAD

PROBLEM TO BE SOLVED: To obtain a thin-film magnetic head which is excellent in recording capability and reproducing efficiency as well. SOLUTION: A magnetic material is subjected to patterning after sputtering, by which lower magnetic poles are formed. After an insulating material is sputtered on t...

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Bibliographische Detailangaben
Hauptverfasser: MORIWAKI HIDETOSHI, HAMAKAWA YOSHIHIRO, SHIIKI KAZUO, YUHITO ISAMU, TAKANO KOJI
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To obtain a thin-film magnetic head which is excellent in recording capability and reproducing efficiency as well. SOLUTION: A magnetic material is subjected to patterning after sputtering, by which lower magnetic poles are formed. After an insulating material is sputtered on the lower magnetic poles, the insulating layer material is patterned to form gap films. A high saturation magnetic flux density magnetic material of >=1.3 T in saturation magnetic flux density and an Ni-Fe ('Permalloy (R)') alloy are successively sputtered on the gap films and are thereafter sputtered, by which upper magnetic poles 10 are formed and the thin-film magnetic head is produced.