MANUFACTURING FACILITIES FOR SEMICONDUCTOR DEVICE, PATTERN FORMATION OF SEMICONDUCTOR DEVICE USING THE SAME, AND PHOTORESIST FOR SEMICONDUCTOR MANUFACTURE TO WHICH THE FACILITY IS APPLIED

PROBLEM TO BE SOLVED: To provide the manufacturing facilities for semiconductor devices which form a pattern of preferred size, a pattern forming method for the semiconductor devices, and a photoresist for semiconductor manufacturing which utilize them. SOLUTION: Manufacturing facilities 30 are equi...

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Bibliographische Detailangaben

Hauptverfasser:	JEOUNG GYUAN, RI KO, KIN EIZEN, TEI SHINKO, CHOI KWANG-SEOK
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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