SUBSTRATE CLEANING DEVICE

PROBLEM TO BE SOLVED: To provide a device for cleaning a substrate which can uniformly and sufficiently clean the substrate by maintaining ozone concn. of ozone- containing water constant. SOLUTION: The substrate cleaning device is a device for cleaning a semiconductor wafer W by immersing the semic...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	HAYASHI TOKUYUKI, OZAWA KENJU
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS CLEANING CLEANING IN GENERAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY PERFORMING OPERATIONS PREVENTION OF FOULING IN GENERAL SEMICONDUCTOR DEVICES TRANSPORTING
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