SUBSTRATE CLEANING DEVICE

PROBLEM TO BE SOLVED: To provide a device for cleaning a substrate which can uniformly and sufficiently clean the substrate by maintaining ozone concn. of ozone- containing water constant. SOLUTION: The substrate cleaning device is a device for cleaning a semiconductor wafer W by immersing the semic...

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Bibliographische Detailangaben
Hauptverfasser:	HAYASHI TOKUYUKI, OZAWA KENJU
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS CLEANING CLEANING IN GENERAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY PERFORMING OPERATIONS PREVENTION OF FOULING IN GENERAL SEMICONDUCTOR DEVICES TRANSPORTING
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a device for cleaning a substrate which can uniformly and sufficiently clean the substrate by maintaining ozone concn. of ozone- containing water constant. SOLUTION: The substrate cleaning device is a device for cleaning a semiconductor wafer W by immersing the semiconductor wafer W in the ozone- containing water and is provided with a treating tank 1 storing the ozone- containing water, a pair of caps 2 movable between a closing position covering above the treating tank 1 and an opening position opening above the treating tank 1, a gaseous ozone supplying means 3 for supplying gaseous ozone into a space above the ozone-containing water which is formed by the treating tank 1 and the caps 2 moved to the closing position and an ozone-containing water supplying means 4 for supplying the ozone-containing water into the treating tank 1.