REALIZZAZIONE DI DISPOSITIVI ELETTRONICI IN UN WAFER IN MATERIALE SEMICONDUTTORE CON TRINCEE AVENTI DIREZIONI DIVERSE
A method for integrating a set of electronic devices on a wafer (100; 200a; 200b) of semiconductor material having a main surface includes forming a plurality of trenches extending into the wafer from the main surface. At least one layer of electrically insulating material is formed within each tren...
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Format: | Patent |
Sprache: | ita |
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Zusammenfassung: | A method for integrating a set of electronic devices on a wafer (100; 200a; 200b) of semiconductor material having a main surface includes forming a plurality of trenches extending into the wafer from the main surface. At least one layer of electrically insulating material is formed within each trench. At least one layer of electrically conductive material is formed within each trench superimposed on the at least one layer of insulating material. The formation of the plurality of trenches includes forming the trenches partitioned into sub-sets of trenches. The trenches of a first sub-set are oriented along a first common direction that is different from the orientation of the trenches of a second sub-set. |
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