PROCESSO DI FABBRICAZIONE PER CELLE EPROM CON DIELETTRICO OSSIDO-NITRURO-OSSIDO
The process calls for covering of the dielectric (6) with a thin additional layer of polysilicon (10) which has the function of protecting the dielectric from any defects which would otherwise be introduced from the subsequent masking.
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Format: | Patent |
Sprache: | ita |
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Zusammenfassung: | The process calls for covering of the dielectric (6) with a thin additional layer of polysilicon (10) which has the function of protecting the dielectric from any defects which would otherwise be introduced from the subsequent masking. |
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