TENUTA AD ALTA PRESSIONE PARTICOLARMENTE PER CAMERA AD IONIZZAZIONE

A substrate penetrates a main seal in an ionization chamber filled with pressurized gas. In one form of the present invention, a second chamber is provided around the region of penetration. The substrate then also penetrates the second chamber. The second chamber is pressurized with a gas at a lower...

Ausführliche Beschreibung

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Bibliographische Detailangaben
1. Verfasser:	WOJCIECHOWSKI CHARLES ROBERT
Format:	Patent
Sprache:	ita
Schlagworte:	BASIC ELECTRIC ELEMENTS BLASTING CYLINDERS ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY ENGINEERING ELEMENTS AND UNITS GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVEFUNCTIONING OF MACHINES OR INSTALLATIONS HEATING LIGHTING MEASUREMENT OF NUCLEAR OR X-RADIATION MEASURING MECHANICAL ENGINEERING PHYSICS PISTONS SEALINGS TESTING THERMAL INSULATION IN GENERAL WEAPONS
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Beschreibung
Zusammenfassung:	A substrate penetrates a main seal in an ionization chamber filled with pressurized gas. In one form of the present invention, a second chamber is provided around the region of penetration. The substrate then also penetrates the second chamber. The second chamber is pressurized with a gas at a lower pressure than in the ionization chamber. Thus, the pressure differential across the main seal is lowered, thereby reducing the load on the main seal.