PROCESSO E SOLUZIONE DI ELETTROPLACCATURA CON CROMO TRIVALENTE A BASSA CONCENTRAZIONE

PROCESSO E SOLUZIONE DI ELETTROPLACCATURA CON CROMO TRIVALENTE A BASSA CONCENTRAZIONE

The Cr concn. is 0.03M and is sufficiently weak to give a deposit whose colour is at least as bright as that of vapour deposited Cr. Bright Cr coatings can be formed (without the attendant problems of using Cr6+ baths) for decorative applications, and thick, coherent, smooth coatings can be formed f...

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Bibliographische Detailangaben
Hauptverfasser: BARCLAY DONALD JOHN, LINFORD VIGAR JAMES MICHAEL
Format: Patent
Sprache:ita
Schlagworte:
APPARATUS THEREFOR
CHEMISTRY
ELECTROFORMING
ELECTROLYTIC OR ELECTROPHORETIC PROCESSES
METALLURGY
PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTIONOF COATINGS
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Zusammenfassung:The Cr concn. is 0.03M and is sufficiently weak to give a deposit whose colour is at least as bright as that of vapour deposited Cr. Bright Cr coatings can be formed (without the attendant problems of using Cr6+ baths) for decorative applications, and thick, coherent, smooth coatings can be formed for structural and mechanical applications. The ratio of the molar concns. of Cr/thiocyanate is pref. 1 : 2-4. The soln. pref. also contains an amino-acid (pref. aspartic acid) as buffer, in a molar concn. 1.25 times that of Cr. The bath temp. for a bright coating is pref. 40-60 degrees C, the brightest coloured coatings being formed using a current density >50 mA/cm2. The Cr concn. is pref. =0.02M. The pH of the bath is pref. 3.8 - 4.5.