PROCEDIMENTO DI PREPARAZIONE DI TETRAFLUORURO DI SILICIO USANDO ACIDO FLUORIDRICO GASSOSO

PROCEDIMENTO DI PREPARAZIONE DI TETRAFLUORURO DI SILICIO USANDO ACIDO FLUORIDRICO GASSOSO

A process of preparing silicon tetrafluoride by introducing hydrogen fluoride gas into a dispersion of powdery silicon oxide material, which needs not to be pure SiO2, in sulfuric acid not lower than 65% in the concentration of H2SO4. The reaction takes place even at room temperature. By using amorp...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: OTSUKA TOYOZO, KITSUGI NAOMICHI, FUJINAGA TERUO
Format: Patent
Sprache:ita
Schlagworte:
CHEMISTRY
COMPOUNDS THEREOF
INORGANIC CHEMISTRY
METALLURGY
NON-METALLIC ELEMENTS
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:A process of preparing silicon tetrafluoride by introducing hydrogen fluoride gas into a dispersion of powdery silicon oxide material, which needs not to be pure SiO2, in sulfuric acid not lower than 65% in the concentration of H2SO4. The reaction takes place even at room temperature. By using amorphous silicon oxide material, the rate of reaction can be enhanced with better yield. Preferably, the concentration of H2SO4 in the liquid phase of the reaction system is maintained above 80% to obtain SiF4 containing little (SiF3)2O.