METHOD OF FORMING OPTOELECTRONIC DEVICE HAVING A STABILIZED METAL OXIDE LAYER
The present invention is a method comprising depositing a metal oxide layer as part of the production of an optoelectrically active device and exposing the metal oxide layer to a reactive agent to form a relatively hydrophobic surface. The invention also includes device so made preferably a photovol...
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| Format: | Patent |
| Sprache: | eng |
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| Zusammenfassung: | The present invention is a method comprising depositing a metal oxide layer as part of the production of an optoelectrically active device and exposing the metal oxide layer to a reactive agent to form a relatively hydrophobic surface. The invention also includes device so made preferably a photovoltaic device which shows improved stability as compared to devices not subject to the treatment. |
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