Single pad overlay measurement
A method for generation a structure comprising a first grating at a first pitch in a first layer of a multi- layer stack structure; and a second grating at a second pitch in a second layer of the multi-layer stack structure, wherein, when illuminated by incident radiation, scattered radiation from t...
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| Hauptverfasser: | , , , , |
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| Format: | Patent |
| Sprache: | eng ; heb |
| Online-Zugang: | Volltext bestellen |
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| Zusammenfassung: | A method for generation a structure comprising a first grating at a first pitch in a first layer of a multi- layer stack structure; and a second grating at a second pitch in a second layer of the multi-layer stack structure, wherein, when illuminated by incident radiation, scattered radiation from the measurement structure forms an interference pattern at a detector, wherein the interference pattern comprises at 5 least a first Moire interference component and a second Moire interference component, is described. A method for measuring a parameter of interest in a manufacturing process based on the measurement structure is described, comprising obtaining an interference pattern for the measurement structure, identifying a first Moire interference component and identifying a second Moire interference component in the interference pattern; and determining the measurement of a parameter of interest 0 based on the first Moire interference component and the second Moire interference component. |
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