Method of processing a sample with a charged particle assessment system

Methods of processing a sample and charged particle assessment systems are disclosed. In one arrangement, a sample is processed using a multi-beam of sub-beams of charged particles. At least a portion of a sub-beam processable area is processed with each sub-beam. The sub-beam processable area compr...

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Bibliographische Detailangaben
Hauptverfasser: KUIPER Vincent Sylvester, VAN SOEST Jurgen, WIELAND Marco Jan-Jaco
Format: Patent
Sprache:eng ; heb
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Beschreibung
Zusammenfassung:Methods of processing a sample and charged particle assessment systems are disclosed. In one arrangement, a sample is processed using a multi-beam of sub-beams of charged particles. At least a portion of a sub-beam processable area is processed with each sub-beam. The sub-beam processable area comprising an array of sections having rows of sections and columns of sections. Each row of sections defines an elongate region that is substantially equal to or smaller than a pitch at the sample surface of the sub-beams in the multi-beam. A plurality of the sections are processed.