HETEROARYL DERIVATIVES AND USES THEREOF

The present invention relates to antimalarial compounds and their use against protozoa of the genus Plasmodium, including drug-resistant Plasmodia strains. This invention further relates to compositions containing such compounds and a process for making the compounds.

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Bibliographische Detailangaben
Hauptverfasser: HEFFERNAN, Gavin, ZHAO, Wenyi, SCHIEHSER, Guy, SHIEH, Hong-Ming, SAIONZ, Kurt, JACOBUS, David
Format: Patent
Sprache:eng ; hun
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Beschreibung
Zusammenfassung:The present invention relates to antimalarial compounds and their use against protozoa of the genus Plasmodium, including drug-resistant Plasmodia strains. This invention further relates to compositions containing such compounds and a process for making the compounds.